As semiconductor manufacturing advances toward smaller and more powerful devices, achieving atomic-level precision has become one of the greatest challenges faced by the industry. Lithography expert Erik Hosler points out that achieving this level of accuracy is essential for optimal performance, particularly when working with sub-7 nanometer (nm) nodes, where even the smallest variation can lead to performance issues or defects. Manufacturers are continually pushing the limits of technology to meet these demands, but the path to achieving this degree of precision is fraught with obstacles. The Challenge of Line-Edge Roughness (LER) One of the primary obstacles manufacturers face when…